GSK-EDB-HRD Bursary

The GSK-EDB-HRD Bursary was established to support financially disadvantaged but deserving undergraduates pursuing a full-time undergraduate degree at the Singapore Institute of Technology (SIT).

Eligibility

Applicants must meet the following criteria:

  • Full-time students pursuing an undergraduate degree programme in the Chemical Engineering and Food Technology, Engineering or Infocomm Technology clusters offered by the Institute;
  • Are Singapore Citizens; and
  • Have a household per capita income (PCI) of less than or equal to $1,000, or students who have provided evidence of family financial difficulties, to be determined by the Institute in its sole discretion.

Tenure and Benefits of the Bursary:

  • Each Bursary is valued at S$5,000 and is tenable for one academic year.
  • The Bursary shall be used for the recipient’s educational expenses such as tuition fees, course materials, expenses for study trips and fees for other educational activities organised by the Institute.
  • Recipients of this Bursary may accept another bursary concurrently.
  • No bond is required of the recipient.

About the Donor

This bursary has been made possible with a gift from the GlaxoSmithKline – EDB HRD Fund, established by Glaxo Wellcome Manufacturing Pte Ltd and Singapore’s Economic Development Board in 1990. The Fund seeks to develop a sustainable pipeline of Singapore’s human capital through education and training. Over the years, the Fund has supported several programmes and initiatives by schools and institutions to achieve this objective.

How To Apply

Application Process

Matriculated students are to submit their Financial Aid application via the SIT Student Intranet - IN4SIT. Do note that students are to connect to the SIT VPN before accessing IN4SIT. 

Applicants will need to complete and submit the online application form and upload all required supporting documents through the application portal by the given deadline.


Please refer to the Frequently Asked Questions for more information.